Telecom Engineers, Glew Engineering

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Mechanical Engineering, Glew Engineering
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Chemical Vapor Disposition

At Glew Engineering Consulting, our team of engineers, scientists, and consultants have decades of experience with technologies in industries ranging from Semiconductor, Energy, Medical, and Automotive. We offer expertise in the following categories:

CHEMICAL VAPOR DEPOSITION

Chemical vapor deposition (CVD) is a processed used in the semiconductor industry to produce thin films for integrated circuits. Typically, a wafer is exposed to volatile precursors that react to deposit a thin film of material such as silicon, silicon carbide, high-k dielectric material, or other. Various types of CVD are used in the industry, including:

  • Plasma Enhanced Chemical Vapor Deposition (PECVD) – a process that uses plasma to enhance the reaction rate and reduce the reaction temperature
  • High Density Plasma Chemical Vapor Deposition (HDPCVD) – a process often used to deposit films with high aspect ratios
  • Rapid Thermal Chemical Vapor Deposition (RTCVD) – a process that heats the wafer substrate without heating the chamber or reactants 

Engineering Consultants

Glew Engineering provides consultants with decades of experience in chemical vapor deposition equipment and technology. Not only do they specialize in the processes and equipment used in deposition, (CVD, PECVD, HDPCVD, RTCVD and other), but their expertise also lies in business development, product marketing and project turn-around for related technology.

Contact us to see how we can help you!